- Turkish Journal of Physics
- Vol: 23 Issue: 6
- Feasibility of Fabrication of Heteroepitaxial Gex Si1-x/Si(111) structure by Pulsed Nd: YAG Laser
Feasibility of Fabrication of Heteroepitaxial Gex Si1-x/Si(111) structure by Pulsed Nd: YAG Laser
Authors : R. A. Ismail, R. N. Mousis
Pages : 951-958
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Publication Date : 9999-12-31
Article Type : Makaleler
Abstract :Heteroepitaxial Gex Si1-x alloy layers have been formed by 10 ms and 300 m s laser pulse induced mixing of pure germanium films and Si(111) substrates where Ge films of thickness (500-1250) Å are thermally evaporated onto Si(111) under vacuum pressure \sim 10-5 Torr. The near surface of the sample then undergoes rapid melting and regrowth processes during each pulse from a free running Nd; YAG laser. The alloy layers are (4.6-6.5) mm thick and have a Ge fraction of x = 6-8.2%.Keywords : Turk. J. Phys., 23, (1999), 951-958. Full text: pdf Other articles published in the same issue: Turk. J. Phys., vol.23, iss.6.