- Journal of Physical Chemistry and Functional Materials
- Vol: 1 Issue: 1
- The Structural Properties of MoO3 Thin Films Grown by Magnetron Sputtering Technique
The Structural Properties of MoO3 Thin Films Grown by Magnetron Sputtering Technique
Authors : Beyhan Tatar, Canan Yöney, Dilek Demiroğlu
Pages : 52-56
View : 9 | Download : 5
Publication Date : 2018-08-06
Article Type : Research
Abstract :T he molybdenum trioxide MoO 3 thin films were growth on c-Si substrates by magnetron sputtering technique. The structural and morphological properties of MoO 3 thin films were investigated by XRD, RAMAN and SEM analysis. Prior to annealing process, X-ray diffractogram indicated that MoO 3 thin films vere amorphous nature. All of the MoO 3 thin films were applied three different annealing temperature and obtained optimum annealing temperature with 300 0 C. XRD patterns of annealed thin films showed that these MoO 3 thin films have polycrystalline nature with 2 θ peak at 12 ˚ ,23 ˚ , 25 ˚ , 38 ˚ , 55 ˚ and 58 ˚ corresponding to the (020), (110), (040), (060), (112) and (081) planes . RAMAN spectrum of the MoO 3 thin films were determined 1 4 Raman active peaks belong to α -phase MoO 3 . The surface morphology of the MoO 3 thin films as deposited has appeared to be uniform with smaller grains and exhibits a coarse structure. Annealing of the MoO 3 thin films favors growth and agglomeration of small grains.Keywords : MoO3 thin films, Metal oxide semiconductors, Surface Properties, Structural Properties